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Just Accepted in Journal of Materials Chemistry C ‘High density and patternable growth of silicon,germanium and alloyed SiGe nanowires by a rapid anneal protocol’

Just Accepted in Journal of Materials Chemistry C ‘High density and patternable growth of silicon,germanium and alloyed SiGe nanowires by a rapid anneal protocol’

High density and patternable growth of silicon, germanium and alloyed SiGe nanowires by a rapid anneal protocol† M. Bezuidenhout,ab T. Kennedy,b S. Belochapkine,b Y. Guo,b E.   Mullane,b P. A. Kiely‡a  and K. M.  Ryan‡*b Link to paper We  report  the  formation  of  silicon,  germanium  and  alloyed  Si1-xGex   nanowires  by  direct  pyrolysis  of liquid  precursors  on  a  […]